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Fabrication of Silicon Microlens Arrays Using Ion Beam Milling

MAIZhihongYIXingjian

1996半导体光子学与技术:英文版Engineering被引 2

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摘要

A spherical mask for the fabrication of microlens arrays was prepared by melt-ing photoresist,and the spherical photoresist shape was transferred into a silicon substrate using ion beam milling.The ion beam milling process was computer simulated using the Sig-mund ion beam sputtering theory of collision cascades.The experiment results show that mi-crolens arrays can be effectively formed at low substrate temperature of less than 200℃,Shapes and dimensions of photoesist masks and silicon microlens arrays were examined by the scanning electron microscope and tested by the surface stylus measurement.

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MAIZhihong, YIXingjian. Fabrication of Silicon Microlens Arrays Using Ion Beam Milling[J]. 半导体光子学与技术:英文版, 1996.

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