高精度クロムマスク

1972Denki Kagaku oyobi Kogyo Butsuri KagakuEngineering被引 2开放获取

摘要

Recentlyin the manufacture of TrIC and ISIthe photomask is cnmonly of the chromium rather than the emulsion type Fabrication techniques of hlgh precision chromium masks were studied with the aim oHabrication MOS-LSI

引用本文（GB/T 7714）

豊田裕康, 矢田俊雄, 板坂隆史, 等. 高精度クロムマスク[J]. Denki Kagaku oyobi Kogyo Butsuri Kagaku, 1972.

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DOI：https://doi.org/10.5796/kogyobutsurikagaku.40.531

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