Ta2O5/SiO2高反膜在1064 nm的单脉冲和多脉冲损伤研究

Yue Wang、Hongbo He、Yuanan Zhao、Yongguang Shan、Dawei Li、Chaoyang Wei

2011Chinese Optics LettersEngineering被引 1开放获取

摘要

Ta2O5/SiO2 dielectric mirrors deposited by ion beam sputtering (IBS) are studied. The multi-shot laserinduced damage threshold (LIDT) and its dependence on the number of shots are investigated, after which we find that the multi-shot LIDT is lower than that of single-shot. The accumulation effects of defects play an important role in the multi-shot laser damage. A simple model, which includes the conduction band electron production vsa multiphoton and impact ionizations, is presented to explain the experimental phenomena.

引用本文（GB/T 7714）

Yue Wang, Hongbo He, Yuanan Zhao, 等. Ta2O5/SiO2高反膜在1064 nm的单脉冲和多脉冲损伤研究[J]. Chinese Optics Letters, 2011.

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DOI：https://doi.org/10.3788/col201109.023103

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