首页 / 资料库 / 文献详情

射流抛光中垂直喷射材料去除模型

Chunyan ShiJiahu YuanFan WuXi HouYongjian Wan

2010Chinese Optics LettersEngineering被引 12开放获取

出版方页面 →

摘要

It is important for precise fabrication to research the material removal model of polishing. Simulation is done by computational fluid dynamics for fluid jet polishing (FJP). Numerical research and theoretical description for abrasive particles discrete system are taken by population balance modeling method, and experiments are taken to research the removal profile by vertical fluid jet polishing (VFJP). The results of experiment and simulation show that the removal profile of VFJP turns on a W-shaped profile. By analyzing the material removal mechanism of FJP that material is removed by particles impinging wear and wall movement erosion, the mathematical material removal model of VFJP is enduced. Comparing the mathematical material removal model with the experimental removal profile, it is found that the mathematical material removal model of VFJP is accurate.

引用本文(GB/T 7714)

Chunyan Shi, Jiahu Yuan, Fan Wu, 等. 射流抛光中垂直喷射材料去除模型[J]. Chinese Optics Letters, 2010.

引文网络

参考文献与被引分析加载中…

DOI:https://doi.org/10.3788/col20100803.0323

本站仅收录题录与摘要供学习参考,全文版权归属出版方;如有侵权请联系我们删除。