XPS Studies of Magnetic Multilayers
摘要
NiOx/Ni81Fe19 and Co/AlOx/Co magnetic multilayers were fabri cated by reactive RF/DC magnetron sputtering on clean glass substrates and oxidized Si (100) substrates, respectively. The exchange biasing field (Hex) between NiOx and Ni81Fe19 as a function of oxidation stat es was studied by X-ray photoelectron spectroscopy (XPS). The oxidatio n states and the oxide thickness of Al layers in magnetic multilayer f ilms consisting of Co/AlOx/Co were also analyzed. It is found that the Hex of NiOx/Ni81Fe19 films only depends on Ni2+ but not on Ni3+ or Ni . The bottom Co can be completely covered by depositing an Al layer th icker than 2.0nm. The oxide layer was Al2O3, and its thickness was 1.1 5nm.
引用本文(GB/T 7714)
Guanghua, Yu Yu. XPS Studies of Magnetic Multilayers[J]. Acta Scientiarum Naturalium Universitatis Sunyatseni, 2001.
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