Thermal expansion of Ti-Al-N and Cr-Al-N coatings
摘要
The thermal expansion coefficients (TECs) of B1 structured Ti1 − xAlxN and Cr1 − xAlxN thin films – investigated by synchrotron X-ray diffraction from room temperature to 600 °C – excellently agree with ab initio obtained temperature dependent calculations only if they were annealed at 600 °C. As-deposited thin films, with their built-in structural defects show a lower temperature dependence of their TECs and higher values. Furthermore, our data clearly show that the TECs of cubic Ti1 − xAlxN and Cr1 − xAlxN increase with increasing Al content, and that the TEC of wurtzite type B4 structured AlN is only about half of that of B1 AlN.
引用本文(GB/T 7714)
M. Bartosik, David Holec, Daniel Apel, 等. Thermal expansion of Ti-Al-N and Cr-Al-N coatings[J]. Scripta Materialia, 2016.
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