GENETIC OPTIMIZATION OF HOT FILAMENT PARAMETERS IN HFCVD SYSTEM
摘要
In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films. Th e magnitude and the variation of the substrate temperature must be limited in a suitable range to deposit diamond films of uniform thickness over large areas. In this paper, the hot filament parameters are investigated on the basi s of GAs to realize a good substrate temperature profile. Computer simulations d emonstrate that on parameters optimized by GAs a uniform substrate temperatur e field can be formed over a relatively large circle area with R s=10 cm.
引用本文（GB/T 7714）
Song Sheng. GENETIC OPTIMIZATION OF HOT FILAMENT PARAMETERS IN HFCVD SYSTEM[J]. 未知来源, 2003.
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