Study of Nano-crystalline Silicon Films
摘要
By using strong hydrogen dilution of silane in PECVD system and controlling the deposition parameters strictly, we have prepared a-Si:H and nc-Si:H as well as μc-Si:H films respectively. The structural characters of nc-Si: H films detected by means of HREM, Raman and X-ray diffraction spectra are identified as coinciding with the known definition of nanometer solids. The unique electrical and optical properties of nc-Si:H films are considered as the consequence of its novel structures.
引用本文（GB/T 7714）
He Yu, Cheng Guang. Study of Nano-crystalline Silicon Films[J]. 未知来源, 1993.
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