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Optimization of Key Technological Parameters in Bonnet Polishing Using FEA

Ri PanZhenzhong WangChunjin WangYinbiao GuoDongxu Zhang

2012中國機械工程學刊Engineering被引 3

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摘要

Bonnet polishing tool is widely used in rough polishing and fine polishing because of its own features. Ranges of key technological parameters are different in various polishing stages, which related to how the key technological parameters affect the polishing process. In this paper, series of simulations to illustrate the interaction effect of bonnet into work-piece surface using ANSYS are present, aims to get the optimal key technological parameters in rough polishing and fine polishing. It found that the inner pressure of bonnet, the height of bonnet compression, the slant angle of bonnet and bonnet radius are the main factors that influence the features of contacting area, moreover, the former two parameters directly determine the contribution of stress in contacting area. Finally, based on the simulated results, key technological parameters selected are roughly discussed according to the purpose of different polishing stages.

引用本文(GB/T 7714)

Ri Pan, Zhenzhong Wang, Chunjin Wang, 等. Optimization of Key Technological Parameters in Bonnet Polishing Using FEA[J]. 中國機械工程學刊, 2012.

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DOI:https://doi.org/10.29979/jcsme.201210.0001

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