激光预处理对HfO2单层膜缺陷的影响
摘要
The influence of laser conditioning on defects of HfO 2 monolayer films prepared by electron beam evaporation (EBE) is investigated utilizing the spot-size effect of the laser-induced damage. It is found that the laser-induced damage threshold of HfO 2 monolayer films can be increased by a factor of 1.3-1.6. It is also found that the defects with low threshold can be removed by laser conditioning and defects with higher threshold may be removed partially.
引用本文（GB/T 7714）
Xiao Li, Yuanan Zhao, Xiaofeng Liu, 等. 激光预处理对HfO2单层膜缺陷的影响[J]. Chinese Optics Letters, 2010.
引文网络
本站仅收录题录与摘要供学习参考，全文版权归属出版方；如有侵权请联系我们删除。