全反射式极紫外光刻光学系统设计
摘要
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.
引用本文（GB/T 7714）
Jun Keun Chang, Meifang Zou, Ruirui Wang, 等. 全反射式极紫外光刻光学系统设计[J]. Chinese Optics Letters, 2010.
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