Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm Cl2*/308 nm XeCl(B-X)
摘要
Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-Cl 2 mixture at a pressure of P =5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm Cl 2 (D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry.
引用本文（GB/T 7714）
А. К. Шуаибов. Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm Cl2*/308 nm XeCl(B-X)[J]. Technical Physics Letters, 2000.
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